Palosz, Witold F. - Professional profile

Residual gases

General

The research concerns formation of residual gases from the container material (fused silica) and the source material. A presence of the gases may have a strong effect on crystal growth from the vapor (growth rate and morphology), and on crystals grown from the melt (formation of voids, detached solidification). The research concerns:

	Determination of the amount and composition of residual gases in (closed) growth systems.
	Reduction of residual gases, particularly removal of oxygen from the source materials.

Publications

W. Palosz, "Residual gas in closed systems. I. Development of gas in fused silica ampoules", J. Crystal Growth 267/3-4 (2004) 475. View Abstract
W. Palosz, "Residual gas in closed systems. II. Generation and reduction of the gas from the source materials", J. Crystal Growth 267/3-4 (2004) 484. View Abstract

W. Palosz, "W. Palosz, "Residual gas in closed systems. I. Development of gas in silica glass ampoules", Proceedings of the V International Conference on Single Crystals, Obninsk, Russia, September 22 - 26, 2003, p. 754. View PDF

W. Palosz, "Residual gas in closed systems. II. Formation of gases from the source materials, Proceedings of the V International Conference on Single Crystals, Obninsk, Russia, September 22 - 26, 2003, p. 763. View PDF

W. Palosz, "Residual gas in closed systems. III. Development and reduction of gases generated by the source materials, Proceedings of the V International Conference on Single Crystals, Obninsk, Russia, September 22 - 26, 2003, p. 775. View PDF

W. Palosz, "The Origin and Time Dependence of the Amount and Composition of Non-Constituent Gases Present in Crystal Growth Systems", Journal of Japan Society of Microgravity Applications 15, suppl. II (1998) 454. View PDF

W. Palosz, “Diffusive gas losses from silica glass ampoules at elevated temperatures”, J. Crystal Growth 191 (1998) 897. View Abstract

W. Palosz, “Inert Gases in Closed Growth Systems”, in: Materials Research in Low Gravity, ed. N. Ramachandran, Proceedings of SPIE, San Diego, California, 28 - 29 July 1997, vol. 3123, p. 34. View Abstract

W. Palosz, “Removal of oxygen from electronic materials by vapor phase processes”, J. Crystal Growth 173 (1997) 427. View Abstract

W. Palosz, F. R. Szofran, and S. L. Lehoczky, "The Effect of Heat Treatment on the Magnitude and Composition of Residual Gas in Sealed Silica Glass Ampoules", J. Crystal Growth 142 (1994) 215. View Abstract

W. Palosz and H. Wiedemeier, "Residual Gas Pressures in Sealed Fused Silica Glass Ampoules", J. Crystal Growth 131 (1993) 193. View Abstract