Journal
of Crystal Growth
Volume
131, Issues 1-2 , July 1993, Pages 193-198
doi:10.1016/0022-0248(93)90414-R 
Cite or link using doi
Copyright © 1993 Published by Elsevier Science B.V. All rights
reserved.
Residual gas pressures in sealed fused silica glass ampoules
Witold Palosza,
1
and Heribert Wiedemeiera,
a Department of
Chemistry, Rensselaer Polytechnic Institute, Troy, New York 12180-3590, USA
Received 24 December 1992; revised 19 February 1993.
Available online 7 August 2002.
Abstract
The residual gas pressures in sealed and annealed ampoules made from silica
glass have been determined using different methods including a McLeod gauge. It
has been found that the gas build-up in the ampoule is mainly the result of the
ampoule heat treatment; the amount of gas released and trapped during sealing
the ampoule under vacuum is much less. The pressures in the ampoules after heat
treatment range from a few mTorr to a few Torr, depending on the silica glass
and on the outgassing and annealing procedures.
1
Present address: NASA George C. Marshall Space Flight Center, Huntsville,
Alabama 35812, USA.
To whom correspondence should be addressed.
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