Journal
of Crystal Growth
Volume
142, Issues 1-2 , 1 September 1994, Pages 215-224
doi:10.1016/0022-0248(94)90290-9 
Cite or link using doi
Copyright © 1994 Published by Elsevier Science B.V. All rights
reserved.
The effect of heat treatment on the magnitude and composition of residual gas
in sealed silica glass ampoules
W. Palosz
, 1,
F. R. Szofran and S. L. Lehoczky
Space Science Laboratory,
NASA/Marshall Space Flight Center, Huntsville, Alabama 35812, USA
Received 10 February 1994; accepted 22 March 1994. Available
online 31 July 2002.
Abstract
The residual gas pressure and composition in sealed silica glass ampoules as
a function of different treatment procedures has been investigated. The
dependence of the residual gas on the outgassing and annealing parameters has
been determined. The effects of the fused silica brand, of the ampoule
fabrication, and of post-outgassing procedures have been evaluated.
1
NRC Senior Research Associate.
Corresponding author.
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