Abstract

The amounts and composition of residual gases formed in empty sealed silica glass ampoules were investigated. The effect of the silica brand, outgassing and annealing conditions, system geometry, and presence of graphite were determined and discussed.

Author Keywords: A1. Degassing; A1. Residual gas; B1. Silica glass

66.30.Ny; 81.05.Kf; 81.20.Ym

Article Outline

1. Introduction

2. Experimental

3. Results

3.1. The effects of the room temperature outgassing and presence of carbon

3.2. Effect of the surface-area-to-volume ratio

3.3. Effect of the outgassing temperature and time

3.4. Effect of the pressure during outgassing

3.5. Other effects

4. Summary and conclusions

Acknowledgements

References

(7K)
Fig. 1. Experimental system.

(14K)
Fig. 2. Development of gas in ampoules outgassed for 2 h at RT (B), for 16 h at 1000°C (A), and in the presence of carbon (C): (a) GE214 glass; and (b) HSQ300 glass.

(5K)
Fig. 3. Experimental and calculated change of hydrogen pressure with time in HSQ300 ampoules. Upper curves, A/V=0.92 cm²/cm³, outgassing at RT for 2 h (Fig. 2b, B); lower curves, A/V=2.7 cm²/cm³, outgassing at 1000°C for 16 h (Fig. 4b, B).

(11K)
Fig. 4. Development of gas in ampoules of different surface-area-to-volume ratios: (a) GE214 glass; and (b) HSQ300 glass.

(11K)
Fig. 5. Development of gas in ampoules outgassed at different temperatures and for a different time: (a) GE214 glass; and (b) HSQ300 glass.

(6K)
Fig. 6. Development of gas in ampoules outgassed under different ambient pressures.

References

1. M.M. Faktor and I. Garrett, Growth of Crystals from the Vapour. , Chapman & Hall, London (1974).

2. T.C. Harman and J.P. McVittie. J. Electron. Mater. 3 (1974), p. 843. Abstract-Compendex | Abstract-INSPEC  

3. G.J. Russell and J. Woods. J. Crystal Growth 46 (1979), p. 323. Abstract

4. B. Andrews, Private communication.

5. R. Wilcox and L.L. Regel. Int. J. Microgravity Sci. Technol. VIII/I (1995), p. 56.

6. D.J. Larson, Microgravity Materials Science Conference. , Huntsville, AL, USA (1996).

7. D.I. Popov, L.L. Regel and W.R. Wilcox, ACCG-10/ICVGE-9. , Vail, CO, USA (1996).

8. T. Duffar, P. Boiton, P. Dusserre and J. Abadie. J. Crystal Growth 179 (1997), p. 397. SummaryPlus | Full Text + Links | PDF (761 K)

9. W.R. Wilcox and L.L. Regel. J. Jpn. Soc. Microgr. Appl. 15 Suppl. II (1998), p. 460.

10. Y. Morimoto, T. Igarashi, H. Sugahara and S. Nasu. J. Non-Cryst. Solids 139 (1992), p. 35. Abstract-Compendex | Abstract-INSPEC  

11. A.J. Moulson and J.P. Roberts. Trans. Faraday Soc. 57 (1961), p. 1208. Full Text via CrossRef

12. I. Burn and J.P. Roberts. Phys. Chem. Glasses 11 (1970), p. 106. Abstract-INSPEC  

13. G.H.A.M. Van der Steen. Philips Res. Rep. 30 (1975), p. 309. Abstract-Compendex  

14. J.E. Shelby. J. Appl. Phys. 51 (1980), p. 2589. Abstract-Compendex | Abstract-INSPEC   | Full Text via CrossRef

15. J.M. Wiesenfeld, J. Stone, D. Marcuse, C.A. Burrus and S. Yang. J. Appl. Phys. 61 (1987), p. 5447. Abstract-INSPEC   | Full Text via CrossRef

16. I. Fanderlik, Editor, Silica Glass and its Applications, Elsevier, Amsterdam (1991).

17. J.J. Murray, R.F. Pottie and R.L. Sander. J. Mater. Sci. 8 (1973), p. 37. Abstract-Compendex | Abstract-INSPEC   | Full Text via CrossRef

18. W. Palosz and H. Wiedemeier. J. Crystal Growth 131 (1993), p. 193. Abstract

19. W. Palosz, F.R. Szofran and S.L. Lehoczky. J. Crystal Growth 142 (1994), p. 215. Abstract

20. W. Palosz. J. Jpn. Soc. Microgr. Appl. 15 Suppl. II (1998), p. 454.

21. W. Palosz. J. Crystal Growth 191 (1998), p. 897. SummaryPlus | Full Text + Links | PDF (129 K)

22. W. Palosz, J. Crystal Growth, doi:10.1016/j.jcrysgro.2004.04.047.

23. R.H. Doremus, Glass Science. , Wiley, New York (1994).

24. R.H. Doremus, Diffusion of Reactive Molecules in Solids and Melts. , Wiley, New York (2001).

25. R.W. Lee. J. Chem. Phys. 38 (1963), p. 448. Full Text via CrossRef

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