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Journal of Crystal Growth
Volume 267, Issues 3-4 , 1 July 2004, Pages 484-497

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doi:10.1016/j.jcrysgro.2004.04.047    How to Cite or Link Using DOI (Opens New Window)  
Copyright © 2004 Elsevier B.V. All rights reserved.

Residual gas in closed systems—II: generation and reduction of the gas from the source materials

W. PaloszCorresponding Author Contact Information, E-mail The Corresponding Author

BAE Systems, A.S., NASA-Marshall Space Flight Center, SD46, Huntsville, AL 35812, USA

Received 15 May 2002;  accepted 13 March 2004 Communicated by K.W. Benz  Available online 4 June 2004.


Abstract

The amounts and compositions of residual gases formed in sealed ampoules loaded with different sources (elements and II–VI and IV–VI compounds) were investigated. A given source was subjected to a series of heat treatments, with intermediate measurements and removal of the gas accumulated in the system. The results of these experiments are discussed in terms of the underlying thermochemical and kinetic phenomena and practical limitations to reducing the amount of residual gases in sealed ampoules.

Author Keywords: A1. Impurities; A1. Purification; A1. Residual gas

66.30.Jt; 81.05.Dz; 81.05.Hd; 81.20.Ym


Article Outline

1. Introduction
2. Experimental procedures
3. Results and discussion
3.1. Single annealing
3.1.1. Elements
3.1.2. PbTe
3.1.3. Tellurides of Sn, Cd, and Zn
3.1.4. Selenides
3.2. Subsequent heat treatments
3.2.1. Elements
3.2.2. Compounds
4. Discussion
5. Summary
Acknowledgements
Appendix
References



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(7K)
Fig. 1. Dependence of the maximum amount (in terms of pressure) of gas that can be formed as a function of the concentration of oxide impurities in the source. n—the amount of source in moles, T—the temperature, Vf—free volume in the system.

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(4K)
Fig. 2. Schematic representation of the experimental system.

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(11K)
Fig. 3. Pressures of residual gas formed in ampoules with elemental source after consecutive thermal processings. (a) sources outgassed at RT; (b) sources thermally pretreated prior to ampoule seal-off.

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(12K)
Fig. 4. Pressures of residual gas formed in ampoules with PbTe source after consecutive thermal processings. (a) pretreatment without hydrogen: 700°C/vacuum/0.15 h; (b) pretreatment with hydrogen: 700°C (0.5 atm H2/0.15 h+vacuum/0.1 h).

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(5K)
Fig. 5. Pressures of residual gas formed in ampoules with highly contaminated SnTe source after consecutive thermal processings. Source ground and sifted. Pretreatment: 700°C (0.5 atm H2/0.15 h+vacuum/0.1 h).

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(5K)
Fig. 6. Pressures of residual gas formed in ampoules with ZnSe source after consecutive thermal processings. Source ground and sifted. Pretreatment: 700°C (0.5 atm H2/0.15 h+vacuum/0.15 h).

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(6K)
Fig. 7. Degree of volatization of oxides by carbon as a function of the Gibbs energy of formation of carbon monoxide from carbon and MeO oxide.

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(2K)
Fig. 8. Schematic representation of a collision of gas with a spherical particle.

References

1. W. Palosz, J. Crystal Growth, doi:10.1016/j.jcrysgro.2004.04.046

2. W. Palosz, in: N. Ramachandran (Ed.), Material Research in Low Gravity, Proc. of SPIE Vol. 3123, The International Society for Optical Engineering, Bellingham, WA, 1997, p. 34.

3. C.-H. Su, W. Palosz, S. Feth and S.L. Lehoczky. J. Crystal Growth 192 (1998), p. 386. SummaryPlus | Full Text + Links | PDF (321 K)

4. W. Palosz. J. Crystal Growth 216 (2000), p. 273. SummaryPlus | Full Text + Links | PDF (177 K)

5. W. Palosz, ICCG-13/ICVGE-11 July 31–August 3, 2001, Kyoto, Japan.

6. W. Palosz. J. Jap. Soc. Microgr. Appl. 15 Suppl. II (1998), p. 454.

7. W. Palosz, Proceedings of the Fifth International Conference on Single Crystals, Obninsk, Russia, September 22–26, 2003, p. 763; http://www.sciencedirect.com/science?_ob=RedirectURL&_method=externObjLink&_locator=url&_cdi=5302&_plusSign=%2B&_targetURL=https%253A%252F%252Fwww.mevsolutions.net%252Fraes%252FwpaloszPubs.htmlResidualGases.

8. W. Palosz. J. Crystal Growth 173 (1997), p. 427. SummaryPlus | Full Text + Links | PDF (868 K)

9. W. Palosz, Proceedings of the Fifth International Conference on Single Crystals, Obninsk, Russia, September 22–26, 2003, p. 775; http://www.sciencedirect.com/science?_ob=RedirectURL&_method=externObjLink&_locator=url&_cdi=5302&_plusSign=%2B&_targetURL=https%253A%252F%252Fwww.mevsolutions.net%252Fraes%252FwpaloszPubs.htmlResidualGases.

10. K.R. Lange. J. Coll. Sci. 20 (1965), p. 231. Abstract

11. W. Palosz. J. Crystal Growth 191 (1998), p. 897. SummaryPlus | Full Text + Links | PDF (129 K)

12. W. Palosz and H. Wiedemeier. J. Crystal Growth 129 (1993), p. 653. Abstract


Corresponding Author Contact InformationCorresponding author. Tel.: +1-256-544-1272; fax: +1-256-544-6762



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Journal of Crystal Growth
Volume 267, Issues 3-4 , 1 July 2004, Pages 484-497


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